This Act may be called the Semiconductor Integrated Circuits Layout-Design Act, 2000.
该法被称为《2000年半导体集成电路布图设计法》。
The utility model can protect the film from pollution and increases the printing quality of photolithography during the production of semiconductor integrated circuits.
本实用新型可保护薄膜不受污染,提高半导体集成电路生产过程中的照相平版印刷质量。
All of the currents (in virtually all integrated circuits) are confined to a very thin region near one face of a semiconductor crystal.
所有的电流(在所有的集成电路中)实际上局限于靠近半导体晶体面非常薄的区域内。
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