The reaction parameters such as the parameters of RF-sputtering, the category of the chelation and the environment of the solution are investigated.
研究溅射参数、络合剂与反应溶液环境等反应参数对制备过程的影响。
Dielectric breakdown of BST thin films prepared by RF sputtering is studied in this paper.
采用射频溅射制备BST薄膜，研究了薄膜的介电击穿特性。
Through the technology of RF and DC reactive sputtering manufacture, H2S gas sensors have been developed on silicon substrate on which a heater made of Pt were attached.
通过交流和直流反应溅射，我们以硅基片（表面上有白金加热电极）为基底制作H_2S气敏元件。
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