Typical chemical mechanical polishing (CMP) of copper layers on semiconductor devices involves using a hard pad in the first step and a soft pad for the barrier layer removal step.

半导体器件上铜层化学机械抛光(CMP)的第一道工序一般需要使用一块硬抛光垫，在磨去阻挡层的工序中要用到软垫。

youdao

Mr. MARK REGEV (Spokesman, Israeli Government): For political reasons, many of them refused to acknowledge that they would be moving, and only with their actual removal from Gaza have they started to think about what the next step will be.

NPR: Former Gaza Settlers Face Uncertain Future

They secured the removal of language contained in early drafts that spoke of a Copenhagen deal as a step on the road to a legally binding treaty.

ECONOMIST: Climate change after Copenhagen

"We do, however, see the removal of implicit government support for the UK banking sector as being a necessary and important step forward as the sector returns to standalone strength, " RBS said in a statement.

BBC: UK financial firms downgraded by Moody's rating agency