RF(Radio-Frequency)Sputtering反应性气体溅镀(Reactive Gas Sputtering) 将少许的反应性气体如N2,O2,烷 等随同惰性气体(Ar)一起
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For reactive sputtering, the gradient films with varying ratio of chemical component can be prepared by changing gas flow rate continuously.
对于反应溅射，可通过连续改变反应气体流量制得化学成分比连续变化的梯度薄膜。
Through the technology of RF and DC reactive sputtering manufacture, H2S gas sensors have been developed on silicon substrate on which a heater made of Pt were attached.
通过交流和直流反应溅射，我们以硅基片（表面上有白金加热电极）为基底制作H_2S气敏元件。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
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