x ray mask 射线掩模
x ray mask x 射线掩模
X-ray mask X射线掩模
X-ray mask matetrial X射线光刻掩膜材料
ray lithography mask 射线光刻掩膜
x-ray lithography mask x射线光刻掩模
moving mask deep X-ray lithography 移动X射线光罩微影术
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
According to Kirchhoff's scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed.
基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。
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