x ray lithography X射线光刻
x-ray lithography X 射线光刻技术
x ray lithography x 射线光刻技术
X-ray lithography X射线光刻 ; 第一步 ; X光光刻 ; 射线印刷术
soft X-ray lithography 软X射线光刻
Proximity X-ray Lithography 射线微影术
x - ray lithography x射线光刻
ray lithography mask 射线光刻掩膜
x-ray lithography mask x射线光刻掩模
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
对利用X射线光刻制作大高宽比硬x射线波带片的设计和制作工艺进行了研究。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
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