The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.
结果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽压大小能够满足化学气相沉积的要求，有足够的挥发速率。
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