... POSSIBLE DEFECT 可能的缺陷 To Next Process 下一过程 Tk = Tq + Ty 其中：Tq 反应潜伏时间, Ty 运动时间 . （2）人的信息传输 43bit/s, 70bit/s （3）人的记忆特性：感觉信息存储 ...
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Only when both analyses are accurate is it possible to correctly foretell the possible defect area.
只有将这两种分析结合起来并计算准确，才有可能准确地预测出潜在的铸造缺陷。
The defect and energy level effect of antimony-doped tin oxide were discussed with possible defect reactions for the conductive powder.
探讨了锑掺杂氧化锡的缺陷与能级效应，确定了导电粉末中掺杂效应的缺陷反应。
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