... 正像工艺 印制电路工艺用npositive process 正性光刻胶 positive photoresist 正则管 regular tube ...
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... positive photoresist 正性光刻胶 positive photoresist 正性胶 positive phototool 正像掩模 ...
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auxiliary reagent for positive photoresist 正性胶配套试剂
developer for positive photoresist 正胶显影液
LCDLCD positive photoresist 正性光刻胶
electron-beam positive photoresist 电子束正性抗蚀剂
LCD positive photoresist LCD正性光刻胶
Thinner for positive photoresist 正型光刻胶稀释剂
POSITIVE PHOTORESIST THINNER 正胶稀释剂
positive photoresist techniques 正胶工艺
ultraviolet positive photoresist 紫外正性光刻胶
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The positive photoresist composition which is suitable for used in a resist coating method by a discharge nozzle system can be provided according to the invention.
根据本发明可提供能够适用于排出喷嘴式的抗蚀剂涂布法的正型光致抗蚀剂组合物。
We can better control the positive photoresist figure, provide a reference for making MEMS and MOEMS, it is of an important instructional significance for deep relief of micro structure.
通过对光刻工艺过程的研究，可为较好地控制正性光刻胶面形，制作微机械、微光学器件提供了参考依据，对微浮雕结构的深刻蚀具有重要的指导意义。
The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ), including(1) the molecular hydrogen bonding interactions between novolak and DNQ;
本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理，主要包括（1）分子间氢键作用机理；
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