Polycrystalline nickel silicide film formed on thin oxide by rapid thermal annealing (RTA) has been investigated by capacitance voltage ( C V ) measurements.

本文研究了在薄二氧化硅层上快速热退火（RTA）形成的多晶硅化镍膜的电特性。

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Lab and field test show that the service life of electroplated diamond bit of Nickel Cobalt Manganese alloy matrix, whose diameter is protected by polycrystalline diamond, will be improved by 30%.

通过试验得出采用方柱状聚晶保径或采用镍钴锰合金胎体，电镀金刚石钻头的保径效果好，钻头寿命可提高3 0 %以上。

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