多晶栅
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single poly gate 单晶多晶栅
Dual Poly Gate implant 双多晶硅栅离子注入
dual poly gate 双多晶硅栅
poly gate depletion effect 多晶栅耗尽效应
poly si gate 多晶硅栅
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One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.
关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。
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