The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad.

本发明提供一种抛光垫，在抛光垫具有抛光媒质的情况下，用于抛光磁的、光学的和半导体衬底中至少一种。

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At present, the most widely used for stainless steel kitchenware, lamps, motorcycle parts, auto parts and other fine polishing medium hardness of materials, but also for free grinding.

目前，最为广泛地应用于不锈钢餐厨具，灯具灯饰摩托车零件，汽车配件等中等硬度材料的精细抛光，也用于自由研磨。

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Recommended Applications: Resin bonded grinding wheels, electroplated products; grinding and polishing optical glass, ceramics and medium toughness stone, etc.

适用范围：适用于树脂结合剂砂轮、电镀产品，加工光学玻璃、陶瓷、中等硬度石材等的研磨抛光。

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