The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
The electronics industry uses it in plasma and thermal cleaning applications for its advantages such as high etch rates, high selectivity, carbon-free etching, and minimal residual contamination.
由于它的优点，如高蚀刻率、高选择性、无碳蚀刻和最小限度的残留污染，电子工业把它用在等离子和热清洁应用中。
The results showed that plasma treatment would etch film surface, which would affect the roughness of film surface and the density of grafted ammonia group.
结果表明，氨等离子处理会对膜表面产生一定的刻蚀作用，从而影响膜表面的粗糙度及氨基接枝密度；
应用推荐