In this paper, research progress on numerical simulation of planar flow casting procession is reviewed.
本文对平面流铸工艺快速凝固过程的数值模拟研究现状作了介绍。
Conventional transistors use a metal electrode, called the gate, to control the flow of electrons through a planar channel in the silicon substrate.
传统晶体管使用一个叫做“栅极”的金属电极，以控制电子在平面硅基片上的沟道中的流动。
The flow field of planar jet is simulated by discrete vortex method.
采用离散涡方法对平面射流流场进行了数值模拟。
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