... 光阻蚀刻术 photoresist technique 冰冻蚀刻术 freeze etching technique 玻璃蚀刻术 hyalography ...
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Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source (on the resist formation) were investigated.
对基于SU - 8胶的UV - LIGA技术进行了工艺优化，研究了光源波长和曝光时间对SU - 8胶成型的影响。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
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