Kodak photo resist 柯达感光耐蚀剂
Liquid Photo Resist Ink 光阻油墨 ; 液态光阻油墨
photo-resist 光致抗蚀剂 ; 光刻胶
ELECTRODEPOSITION PHOTO RESIST 电泳光阻
photo-resist stripping 去除光刻胶
k photo resist 柯达感光耐蚀剂
electron-beam photo-resist exposure 光致抗蚀剂的电子束曝光
As a result, it is reasonable to regard the thick film photo resist as grating with variable refractive index during exposure process.
由于厚层光刻胶折射率在空间上呈缓慢变化的特点，为降低其数值计算量和编程难度，可以将厚层光刻胶近似为折射率随曝光时间变化的光栅。
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Electroformed apertures reproduce the mandrel photo resist finish faithfully and do not require any further processing.
电铸复制卷筒照片孔型图，不需要进一步的加工。
The photo resist consists of binder polymer which makes the photopolymer alkaline soluble, multi-functional monomers, pigments, photo initiators and solvents.
彩色光阻剂的主要成分包括：碱可溶性树脂、光固化树脂、颜料、光引发剂、有机溶剂以及添加剂。
Then Fourier model method, mostly applied to study the diffractive properties of gratings is adopted to analyze the diffractive image field in thick film photo resist.
建立了描述厚层光刻胶内衍射光场形成过程的物理模型，并利用傅里叶模方法模拟计算和分析了其内部衍射光场分布。
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