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The effects of pulse peak current density on the texture and hardness of electrodeposited Ni were investigated.
考察了脉冲峰值电流密度对纳米晶镍镀层织构和硬度的影响。
Cyclic voltammetry was also used to study the effect of content of cupric ions and arsenic ions on peak current density and peak potential of cyclic voltammetry graphs of copper electrodeposition.
并用循环伏安法研究铜砷共沉积过程中铜离子浓度、砷离子浓度等因素对铜沉积过程峰电流密度和峰电势的影响。
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