Laser parallel direct writing 激光并行直写光刻
parallel laser direct writing 并行激光直写
Parallel laser direct writing system 并行激光直写系统
We propose the parallel direct writing method based on a transmitted intensity-modulating spatial light modulator. It can improve the writing speed owing to its stepper exposure mode.
针对传统直写技术写入速度慢、加工时间长的缺点,提出了基于透射式强度型空间光调制器的并行直写方法,采用逐个图形曝光方式可大大提高直写速度,降低生产成本。
参考来源 - 二元光学元件矢量衍射设计与并行直写制作·2,447,543篇论文数据，部分数据来源于NoteExpress
Some binary optical elements were manufactured by parallel direct writing and inductive couple plasma etching technology.
利用并行直写技术与感应耦合等离子刻蚀技术制作了部分二元光学元件。
An innovative parallel laser direct writing system based on intensity modulating spatial light modulator (SLM) is proposed, and the math model about this system is established.
提出了一种基于强度调制型空间光调制器(SL M)的并行激光直写系统，建立了该系统的数学模型。
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