Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.

纳米压印作为非光学的下一代光刻技术，具有分辨率高、成本低、产率高等诸多优点，因而可能应用于将来的半导体制造中。

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Deep? Sub? Micron optical lithography process is facing more and more serious challenge.

深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。

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The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.

光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。

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Nanotechnology techniques such as self-assembling promise researchers an intriguing alternative to continuing to refine the most commonly used technique for building transistors on silicon computer chips, namely, optical lithography.

FORBES: Magazine Article

Optical lithography techniques become increasingly problematic as engineers build tinier devices--the wavelength of the light used to cast patterns onto silicon is already bigger than the width of the devices engineers want to create.

FORBES: Magazine Article