In this paper, the aberration theory of electron image forming systems in the combined focusing and deflecting field has been researched using the technology of numerical simulation.

本文利用数值仿真技术对复合场中电子成像系统的像差理论做了研究。

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In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.

在高数值孔径、低工艺因子的光刻技术中，投影物镜彗差对光刻质量的影响变得越来越突出，因而需要一种快速、高精度的彗差原位测量技术。

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We considered intensity distribution of light focused by a high numerical aperture lens without spherical aberration through a planar interface between materials of mismatch refractive index.

采用光的矢量衍射理论 ，研究了场振幅为高斯分布的平面波入射到无球差高数值孔径物镜上 ，折射率失配对共焦显微术的影响 ，并进行数值模拟。

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