After irradiated by ultraviolet (UV) light with a deuterium lamp for 5 h, the thickness of film decreases largely by 55%, and the refractive index of film changes from 1.484 to 1.445 at 550 nm.

经过紫外氘灯光源照射5个小时之后，薄膜厚度减少了55%，而折射率从1.484减小为1.445，光学厚度更是随着照射时间增长呈现出指数变化。

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Zech (The ADVENT Group of Colorado Springs, CO) noted optical storage technology expert, a new commercial optical storage technology using UV light would probably have to be in the 200 nm range and would provide storage capacities of over 100 GB in a single layer.

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