RD6 series resist developer for quick resist development, universally compatible with the development of positive or negative resists.
RD 6系列光刻胶显影液，可用于正负型光刻胶且显影速度快。
Its strength lies in the fact that it resists the negative effects of hardness in the water on its ability to remove heavy metals.
它的优势在于它能够水中硬度的负面影响，从而消除重金属。
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