dc negative high voltage 直流负高压
negative high voltage power source 负高压电源
high-voltage negative-ion generator 高压负离子发生器
Negative DC high voltage 负直流高压
negative direct current high voltage 直流负高压
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
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