Still referring to FIG. 2, note that a power mask (PDN) is active for the entire multi-slot period.

仍然参考图2，注意在整个多时隙期间，功率屏蔽（PDN）始终是活动的。

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Kohler illumination was used in proximity lithography, and a flys eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.

接近式光刻中一般采用柯勒照明系统，并采用蝇眼透镜形成多点光源均匀掩模面的光场分布。

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Finally, a novel method to detect the profile of the multi-layer dielectric grating mask without any damage is put forward here.

最后论文提出了一种研究多层介质膜光栅掩模的无损检测方法。

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