semiconductor microlithography 半导体显微光刻
Optical Microlithography XVI 微光刻
Super-microlithography 超微细光刻
microlithography pattern 微光刻图形
holographic microlithography 全息微光刻
microlithography technology 微光刻技术
Excimer laser Microlithography 准分子激光光刻技术
Moore's Law has difficulties in key technologies such as production cost and semiconductor microlithography, as well as in basic physical ideas.
分析了摩尔定律在制造成本、光刻等关键技术,以及物理基础思想等方面的困难和制约。
A new algorithm which is used to transform center-hollowed polygons of CIF format in microlithography pattern into rectangles of PG3600 format is presented.
给出了一种微光刻图形CIF格式的中间挖空多边形切割成PG 3600格式所需矩形的新算法。
应用推荐