...并在20世纪中叶成为集成电路制作的首选技术，造就了光刻技术（Photolithography）以及后来更广泛的微刻技术（Microlithography）和纳米刻技术（Nanolithography）的诞生。
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semiconductor microlithography 半导体显微光刻
Optical Microlithography XVI 微光刻
Super-microlithography 超微细光刻
microlithography pattern 微光刻图形
microlithography technology 微光刻技术
holographic microlithography 全息微光刻
Excimer laser Microlithography 准分子激光光刻技术
Handbook of Micro lithography, Micromachining, and Micro fabrication. Vol.1: microlithography.
微平版印术，显微机械加工，和微制作手册：卷一：微平版印术。
Moore's Law has difficulties in key technologies such as production cost and semiconductor microlithography, as well as in basic physical ideas.
分析了摩尔定律在制造成本、光刻等关键技术，以及物理基础思想等方面的困难和制约。
A new algorithm which is used to transform center-hollowed polygons of CIF format in microlithography pattern into rectangles of PG3600 format is presented.
给出了一种微光刻图形CIF格式的中间挖空多边形切割成PG 3600格式所需矩形的新算法。
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