A process for the fabrication of Si cone cathode for the build up of vacuum microelectronic devices is proposed and its experimental results are given.
本文介绍了利用半导体硅材料制作的真空微电子器件的核心部件，场致发射硅锥阴极，的工艺研究及实验结果。
The ultra high pure hydrogen peroxide is one of the critical chemical materials for wet chemical process in the microelectronic industry.
超高纯过氧化氢试剂是微电子材料加工必需的关键电子化学品。
The whole experiment demonstrates that monitoring the quality of CCD process and analysing failure of the device by microelectronic test patterns is practical and reliable.
整个实验表明，用微电子测试图形监控CCD工艺、分析器件失效，是可行可靠的。
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