The results are important for the understanding of the mechanism of material removal in the CMP of microelectronic materials.
其结果对于正确理解微电子材料cmp加工中的材料去除机理具有实际意义。
The ultra high pure hydrogen peroxide is one of the critical chemical materials for wet chemical process in the microelectronic industry.
超高纯过氧化氢试剂是微电子材料加工必需的关键电子化学品。
It is an urgent demand of new generation packaging materials with excellent properties in the microelectronic industry.
微电子行业迫切需要新一代优异性能的封装材料。
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