... mask potential 掩蔽电位 mask processing 掩模加工 mask set 掩模组 ...
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Photo Mask Processing 光罩制程
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Considering the ratio of short in the corner of the channel, the small slit & bar design is suitable for four mask processing, and the corner defect can be avoided by tuning bar size.
考虑到沟道转角处的短路几率问题，小的狭缝与遮挡条尺寸设计更加适合于四次淹没光刻工艺，转角处的缺陷可以通过调整遮挡条的尺寸来避免。
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