Essay brief a few kind methods of correcting distortion of Scan Projection Mask Alignment System.
介绍了调整扫描投影式光刻机畸变的几种方法。
Furthermore, a stepwise approach with varying step lengths, and a compensation strategy following the manipulator's rotation are introduced in the IC mask alignment.
对准控制采用阶梯步长逐步逼近算法，并且引入了机械手姿态调整后的补偿控制，以提高对准效率。
LIGA mask technology based on silicon process technique and double side alignment is presented. The processing technology is simple.
提出一种基于硅工艺和双面对准技术的LIGA掩模技术，工艺十分简单。
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