A DC magnetron reactive sputtering system was optimized to deposit high quality, (002)-oriented polycrystalline AlN films.
在本项研究中,通过优化直流磁控反应溅射系统,生长出了高质量的(002)择优取向的AlN多晶薄膜。
参考来源 - RF AlN薄膜体声波谐振器·2,447,543篇论文数据，部分数据来源于NoteExpress
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
Reactive magnetron sputtering was used to prepare many kinds of compound films extensively.
反应磁控溅射被广泛应用于制备化合物薄膜。
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