The alignment system is a critical subsystem of lithography tool. Improving the positioning precision can directly result in the improving of the overlay precision and product quality.
对准系统是光刻机关键子系统之一,提高对准系统精度将直接提高套刻精度,进而提高产品质量,同时对准系统速度和效率也将影响产品生产率。
参考来源 - 基于机器视觉的光刻机自动对准系统The thesis is trying to resolve the problem that the lithography tool working in defocus state because of the failure of the focusing and leveling sensor.
本文着力于解决因光刻机调焦调平测量系统失效导致投影物镜工作在离焦状态而影响硅片曝光质量的问题。
参考来源 - 硅片调焦调平测量系统性能测试方法研究·2,447,543篇论文数据，部分数据来源于NoteExpress
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
应用推荐