... computational lithography 计算光刻 ; 运算微影 Lithography process 光刻工艺 ; 微影制程 dry lithography 奈米干式微影技术 ; 干式光刻 ...
基于12个网页-相关网页
Immersion Lithography process 沉浸式光刻技术
Lithography Process Check 检查 ; 影制程检查
Lithography process control 光刻过程控制
optical lithography process 光刻工艺
lithography process technology 光刻工艺技术
Lithography Printing Process 平版印刷工艺
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.
关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。
Nonlinear distortion caused by diffraction in the lithography process has severely affected the quality of surface profile, which is the main reason for pattern distortion in lithography.
光刻过程中由于光的衍射效应产生的非线性畸变对光刻面形质量具有严重影响，是造成光刻微结构图形失真的主要原因之一。
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