The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.

传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。

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Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.

成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。

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With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.

随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。

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Nanotechnology techniques such as self-assembling promise researchers an intriguing alternative to continuing to refine the most commonly used technique for building transistors on silicon computer chips, namely, optical lithography.

FORBES: Magazine Article

Optical lithography techniques become increasingly problematic as engineers build tinier devices--the wavelength of the light used to cast patterns onto silicon is already bigger than the width of the devices engineers want to create.

FORBES: Magazine Article