激光诱导化学气相沉积法 激光诱导化学气相沉积法（LICVD）是利用反应气体分子对特定 波长激光束的吸收而产生热分解或化学反应， 经成核生长形成超细粉 末。 5.
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...工程研究所 Institute of Precision Engineering, Xian Jiaotong University MEMS与纳米技术之纳米技术V 激光诱导气相沉积(LICVD)法 LICVD原理: 以激光（如CO 2 激光、准分子激光、YAG (yttrium aluminum garnet) 、Ar+等）作为加热源或激励光源，利用反应气...
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... In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
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LICVD method LICVD工艺
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
It is used in many areas. In this paper, the general principles of LICVD (laser induced chemical vapor deposition) were investigated and the measures to reduce dissociated si were put forward.
本文研究了激光诱导化学气相沉积法制备纳米氮化硅的工作原理，提出了减少游离硅的措施，利用双光束激发制备了超微的、非晶纳米氮化硅粉体。
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