Some basic law and characteristics of laser sputtering and film growth process, revealed by a lot of experiment studies are described in detail.

重点阐述了近年来由大量实验研究所揭示出的激光溅射及成膜过程的一些基本特点和规律。

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A discharge model on the sputtering hollow cathode discharge (SHCD) copper ion laser is established, its characteristics of discharge, sputtering and the particle interaction processes are analysed.

本文祥细分析了溅射型空心阴极放电(SHCD)铜离子激光器的放电、溅射特性和粒子的相互作用过程，建立了放电模型。

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Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced.

目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。

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