... ion beam printing 离子束刻蚀法 ion beam sputtering 离子束溅射 ion beam technology 离子束工艺 ...
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ion beam sputtering system 离子束溅镀系统
reactive ion-beam sputtering 反应离子束溅射
ion beam sputtering technology 离子束溅射技术
Dual-ion beam sputtering deposition 双离子束溅射淀积
dual-ion beam sputtering 双离子束溅射
ion beam sputtering method 离子束溅射法
double-ion beam sputtering 双离子束溅射
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
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