ion beam sputtering 离子束溅射
ion beam sputtering system 离子束溅镀系统 ; 离子束微影术
reactive ion-beam sputtering 反应离子束溅射
ion beam sputtering technology 离子束溅射技术
Dual-ion beam sputtering deposition 双离子束溅射淀积
dual ion beam sputtering 双离子束测射
dual-ion beam sputtering 双离子束溅射
ion beam sputtering method 离子束溅射法
double-ion beam sputtering 双离子束溅射
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.
采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
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