interfacial lattice diffusion 晶界处的晶格扩散
The interfacial diffusion of alloying element is important to microstructure, microhardness and interfacial bonding strength.
合金元素在界面两侧的扩散是影响材料显微组织、显微硬度及界面结合强度的关键。
The interfacial diffusion of alloying element is an important factor to microstructure, apparent hardness and interfacial bond strength.
元素在界面两侧的扩散是影响材料显微组织、表观硬度及界面结合强度的关键。
The annealing behavior of the resistivity is correlated with the microstructure and interfacial diffusion of the films.
薄膜电阻率随退火温度的变化行为与薄膜微观结构的变化以及界面扩散有关。
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