An experimental study has been carried out on the doping of polysilicon by ion implantation and diffusion for the preparation of shallow junctions.
本文对多晶硅膜离子注入掺杂和扩散掺杂制备浅发射结进行了实验研究。
A few methods are introduced at home and abroad on producing PIN diodes: diffusion, ion implantation, and epitaxial.
国内外制备PIN二极管主要采用离子注入方法，扩散方法，外延方法。
Phase transition, enhanced diffusion and Y-Al alloy formation are studied using Y implantation with high current extracted from metal vapor vacuum arc (MEVVA) ion source.
利用金属蒸汽真空弧（MEVVA）源所产生的强束流离子注入铝研究了相变、增强扩散和钇铝合金的形成条件。
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