A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.

采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。

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The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.

该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。

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Using high vacuum magnetron sputtering system, it is coated sensitive film on the optical fiber end face, silicon, glass.

并采用高真空磁控溅射镀膜技术将敏感膜溅射在光纤端面、硅片、有机玻璃上。

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