high-frequency plasma 高频等离子体
high frequency plasma gun 高频等离子枪
high frequency plasma annealing 高频等离子退火
high-frequency plasma melting method 高频等离子体熔融法
very-high-frequency plasma-enhanced chemical vapor deposition 超高频等离子体增强化学气相沉积
high assay frequency plasma 高频等离子体
high frequency pulse plasma 高频脉冲
high frequency cold plasma jet 高频冷等离子体炬
High frequency plasma technology is widely used in preparing nano materials, however study papers reported on HF-Plasma reactor is seldom.
高频等离子体技术已经广泛应用于纳米材料的制备，但是有关高频等离子体反应器分析的研究论文较少。
参考来源 - 高频等离子制备纳米微粒反应器的分析·2,447,543篇论文数据，部分数据来源于NoteExpress
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Microcrystalline silicon solar cells with the variation of silane concentration (SC) and discharge power were fabricated by very high frequency plasma-enhanced chemical vapor deposition.
采用甚高频等离子体增强化学气相沉积技术成功地制备了不同硅烷浓度和辉光功率条件下的微晶硅电池。
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