If bubbles of hydrogen gas adhere to the cathode surface, plating is prevented around the bubble and a pit in the coating results.

如果氢气泡粘附到阴极表面上，气泡周围的镀覆就会停止，于是形成一个麻点。

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ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.

摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。

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Then heating the evaporating plating fountain by the heating device to make the impurity to become the gas, then the gas can be separated with the evaporating plating fountain.

然后，通过加热装置加热蒸镀源，以使杂质成为气体而与蒸镀源分离。

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