Gas Etching of Hydraulic Machinery 水力机械的汽蚀
gas etching technique 气体刻蚀技术充气的
etching gas mixture 腐蚀用气体混合物
Etching gas 蚀刻气体
gas-assisted etching 气体辅助刻蚀 ; 气体辅助刻蚀方法
gas-discharge etching 气体放电蚀刻
With the increase of flow of the gas, the etching rate decreases continually.
随着气体流量的增加，刻蚀速度不断降低。
The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.
用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。
The dependence of etching rate and profile on the vacuum pressure, RF pow-er, gas composition and flow rate, and electrode temperature is analyzed.
分析了真空压力、射频功率、气体组合及其流量和电极温度对刻蚀速率、刻蚀剖面的影响；
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