Silicon nitride thin films were prepared onto steel substrates by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique.
采用射频等离子体增强化学气相沉积法(RF - PECVD)在钢衬底上沉积氮化硅薄膜。
The subtle interactions between magnetohydrodynamics and high-frequency plasma waves involving transverse and longitudinal modes are investigated.
本文研究了磁流体力学与高频等离子体波(包括纵横模式)之间的精巧的相互作用。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
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