1064 nm,532 nm frequency-doubled antireflection coating with out buffer layer or with different buffer layers were fabricated by using electron beam evaporation technique on LBO.
采用电子束蒸发方法在LiB3O5(LBO)晶体上制备了无缓冲层和具有不同缓冲层的1064nm,532nm倍频增透膜。
参考来源 - 缓冲层对LiB·2,447,543篇论文数据，部分数据来源于NoteExpress
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