In the first polishing step (S20), the compound semiconductor substrate is polished with a chloric polishing agent.
在第一抛光步骤(S20)中，用含氯抛光剂抛光该化合物半导体衬底。
The invention is a combined chemical-mechanical polishing method, firstly primarily polishing a to-be-flattened layer by first polishing disc in the first polisher platform;
一种复合式化学机械抛光法，是先在第一抛光机台中，以第一抛光盘 对待平坦层进行初步的抛光。
If that's the case with you, work on polishing your basic people skills a little first.
如果你是这样的人，请先打磨下自己的基本社交技巧。
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