A layer of chemical film can be formed on the surface of solid through chemical reaction. The quality of film is decided by the speed of chemical reaction of film surface.
通过化学反应可以在某些固体表面上形成一层化学薄膜，膜的质量是由成膜时膜表面的化学反应速率决定的。
The aluminum layer adhesive force measuring of the aluminum plating thin film is realized standardization by this invention, so manufacturer can control vacuum aluminum plating thin film quality.
本发明使得真空镀铝薄膜的铝层附着力测量实现了标准化，方便生产厂家对真空镀铝薄膜进行质量控制。
On the other hand, it is essential to prepare high quality silicon nitride thin film for gate insulator layer of TFT in order to get excellent TFT.
与此同时，制备高质量的栅绝缘层用氮化 硅薄膜也是制备高性能薄膜晶体管（TFT）这一课题的需要。
应用推荐