The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
对利用X射线光刻制作大高宽比硬x射线波带片的设计和制作工艺进行了研究。
The characteristic of aplanatic system shows that non-aplanatic point imaging can produce aspherical holographic interference for high resolution zone plate fabrication used for X-ray imaging.
利用这种特性可以产生制作高分辨率X射线波带板所需的两束非球面波。
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