Steve Jobs unveils a new photo exposure system for the iPhone.
乔布斯展示了iPhone的全新照片曝光系统。
By showing the composition and key technologies of the exposure system, the challenges in development of lithography instrument are discussed.
通过分析曝光系统的构成和其中的关键技术,探讨了国内研制相关曝光设备所面临的挑战。
A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.
根据平面区域变换的原理,导出电子束曝光机扫描场的畸变校正函数,并给出计算机模拟校正的结果。
应用推荐